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This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
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Table 2424 lists the peak positions of F 1s XPS of fluorine-related molecules/materials.
Table 2424. The peak positions of F 1s XPS of fluorine-related molecules/materials.
Molecule/material |
Type of bond |
Peak position (eV) |
|
|
687.6 [1] |
Adsorbed fluorine on Si |
|
686.4 [2] |
Fluoride on Si |
|
685.3 [3] |
CF4-treated alumina |
F-Al-O |
685.7 |
F-Al-F |
687.0 |
α-AlF3 |
F-Al-F |
686.9 |
[1] R. Morrish, A. Witvrouw, and A. J. Muscat, “Kinetic to transport-limited
anhydrous HF etching of silicon oxynitride films in supercritical CO2,”
J. Phys. Chem. C, vol. 111, no. 42, pp. 15251–15257, Jul. 2007.
[2] E. T. P. Benny and J. Majhi, “An X-ray photoelectron study of the
dependence of HF concentration on an etched silicon surface,” J.
Electron Spectrosc. Relat. Phenom., vol. 58, no. 4, pp. 261–270, Jun.
1992.
[3] C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Mullenberg,
Handbook of X-Ray Photoelectron Spectroscopy: A Reference
Book of Standard Data for Use in X-Ray Photoelectron Spectroscopy.
Eden Prairie, MN, USA: Perkin-Elmer, 1979, p. 44 and 52.
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