Comparison between nickel silicides and cobalt silicides

Comparison between Nickel Silicides and Cobalt Silicides
- Practical Electron Microscopy and Database -
- An Online Book -

Microanalysis | EM Book http://www.globalsino.com/EM/

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There are mainly two factors which contribute to reduction of Si consumption when moving from CoSi₂ to NiSi contacts:
i) Lower resistivity of NiSi. As shown in the tables at page2036_a, such NiSi films show the same sheet resistance with thinner films than CoSi₂ films, therefore less Si is consumed during its formation.
ii) Lower density of Si in NiSi compared to CoSi₂.

Schematic illustration of the reduction of Si consumption when using NiSi instead of CoSi2

Figure 989. Schematic illustration of the reduction of Si consumption when using NiSi instead of CoSi₂. [1]

[1] Lih J. Chen, Silicide Technology for Integrated Circuits, 2004.

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