Techniques for silicides' analysis

Techniques for Silicides' Analysis
- Practical Electron Microscopy and Database -
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Table 997. Techniques for silicides' analysis.

Silicides	TEM	Electron diffraction (ED)	XRD	EDS
Co_xSi_y	Co_xSi_y TEM	ED of cobalt silicides	XRD of cobalt silicides
Cr_xSi_y	CrSi_x TEM
Cu₃Si
DySi_x	DySi_x TEM
ErSi_x		ErSi_x ED
α-FeSi₂	Iron silicide TEM
β-FeSi₂	Iron silicide TEM
GdSi_x	GdSi_x TEM	GdSi_x ED
HfSi
IrSi
MnSi
MnSi_2-x
MnSi₂
Mn₁₁Si₁₉
Mo₅Si₃	TEM imaging of molybdenum silicides
MoSi₂ (C11_b)
MoSi₂ (C40)
MoSi₂
Nb/Nb₅Si₃
Nb₅Si₃ (D8b)
NbSi₂
NbSi₂ (C11_b)
NbSi₃
Ni₂Si	Nickel silicide TEM	ED of nickel silicides	XRD of nickel silicides
NiSi
NiSi₂
Nickel silicide				Extracted the composition of Si-rich nickel silicide: Ni_0.23Si_0.77 and NiSi₂ [1]
Pd₂Si		ED of palladium silicides	XRD of palladium silicides
PtSi
ReSi₂(C11_b)	ReSi_x TEM	ReSi_x ED
RhSi
Ta₅Si₃(C40)
Ta₅Si₃
TaSi₂(C40)
Ti₅Si₃ (D8m)	Titanium silicide TEM	ED of titanium silicide	XRD of titanium silicides
Ti₅Si₃
Ti/Ti₅Si₃
TiSi₂ (C49)
TiSi₂ (C54)
V₃Si
VSi₂ (C11_b)
VSi₂(C40)
W₅Si₃
WSi₂ (C40)
WSi₂ (C11_b)
YbSi_x		YbSi_x ED
ZrSi₂	ZrSi_x TEM

[1] Hou-Yu Chen, Chia-Yi Lin, Min-Cheng Chen, Chien-Chao Huang, and Chao-Hsin Chien, Nickel Silicide Formation using Pulsed Laser Annealing for nMOSFET Performance Improvement, Journal of The Electrochemical Society, 158 (8) H840-H845 (2011).

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